GB/T 37049-2018: Test method for the content of metal impurity in electronic grade polysilicon -- Inductively coupled-plasma mass spectrometry method

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Scope

This standard specifies a method for determining the content of trace metallic impurities
in electronic-grade polysilicon, using inductively coupled plasma mass spectrometry
(ICP-MS).
This standard applies to the determination of iron, chromium, nickel, copper, zinc,
sodium contents in the range of less than 5 ng/g for metallic impurities, as defined in
GB/T 12963.

Basic Data

Standard ID	GB/T 37049-2018 (GB/T37049-2018)
Description (Translated English)	Test method for the content of metal impurity in electronic grade polysilicon -- Inductively coupled-plasma mass spectrometry method
Sector / Industry	National Standard (Recommended)
Classification of Chinese Standard	H17
Classification of International Standard	77.040.30
Word Count Estimation	10,153
Date of Issue	2018-12-28
Date of Implementation	2019-04-01
Issuing agency(ies)	State Administration for Market Regulation, China National Standardization Administration