GB/T 24582-2023: Test method for measuring surface metal impurity content of polycrystalline silicon - Acid extraction-inductively coupled plasma mass spectrometry method

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Scope

This document describes a method for leaching metal impurities from the surface of
polycrystalline silicon using acid and quantitatively determining the content of these
impurities using inductively coupled plasma mass spectrometry (ICP-MS).
This document is applicable to the determination of the content of impurity elements -
including alkali metals, alkaline earth metals, and first-series transition elements (such
as sodium, potassium, calcium, iron, nickel, copper, zinc, and aluminum) - on the
surface of solar-grade and electronic-grade polycrystalline silicon. The determination
limit is 0.01 ng/g.

Basic Data

Standard ID	GB/T 24582-2023 (GB/T24582-2023)
Description (Translated English)	Test method for measuring surface metal impurity content of polycrystalline silicon - Acid extraction-inductively coupled plasma mass spectrometry method
Sector / Industry	National Standard (Recommended)
Classification of Chinese Standard	H17
Classification of International Standard	77.040
Word Count Estimation	10,175
Date of Issue	2023-08-06
Date of Implementation	2024-03-01
Older Standard (superseded by this standard)	GB/T 24582-2009
Issuing agency(ies)	State Administration for Market Regulation, China National Standardization Administration