GB/T 15909-2017 English PDF (GBT15909-2017)

This Standard specifies the technical requirements, test methods, marking, packaging, storage, transportation and safety of silane gas. This Standard applies to saline for electronic industry prepared by magnesium silicide method, reduction of silicon tetrafluoride by sodium aluminum hydride, and chlorosilane disproportionation process. It is mainly used for the production of high-purity polysilicon, low-temperature chemical vapor deposition of silicon dioxide, chemical vapor deposition of silicon nitride, polysilicon isolation layer, polysilicon ohmic contact layer and heterogeneous or homogeneous silicon epitaxial growth raw materials, ion implantation source and laser medium, etc.; it can also be used for the production of solar cells, optical fibers and photoelectric sensors. Molecular formula: SiH4. Relative molecular mass: 32.117 (according to the international relative atomic mass in 2011);